Influence of impurities in the plating solution when using chrome plating additives

Influence of impurities in the plating solution when using chrome plating additives

Sat Jun 28 08:48:05 CST 2025

In the process of using chrome plating additives, the plating solution is sensitive to impurities, and a high content of impurities will affect the brightness of the plated layer as well as the performance quality of the plated layer. So what are the impurities that affect the plating solution?

1. Metal impurities. Harmful impurities in the chromium plating solution are mainly iron, copper, zinc, nickel and so on. The source of these metal impurities is mainly the dissolution of the metal on the workpiece is not covered parts of the metal, the workpiece fell into the plating tank is not salvaged in time and dissolved, the corrosion of the anode material, the workpiece in the anode activation treatment of dissolved metal ions and so on. These metal impurities will affect the conductivity of the plating solution, so that the dispersion of the plating solution and the ability to deep plating will be reduced, and the bright current density of the plated layer will be narrowed.

2. Chlorine ion. Chromium plating solution is sensitive to chloride ions, the permissible value is below 0.3g/L. The source of chloride ion is mainly introduced by the production water used to prepare the bath, and introduced into the plating solution when the plated parts are not thoroughly cleaned before plating. When the content of chloride ions in the plating solution is high, it will reduce the current efficiency and covering ability of the plating solution, and the plated layer will have gray, blossom, pinhole and other phenomena, thus reducing the corrosion resistance of the plated layer.

3. Nitrate ions. The plating solution contains a small amount of nitrate ions can make the plating layer appear gray-black, but also destroy the lead lining of the plating bath. When the content of nitrate ions in the plating solution reaches 1g/L, it is necessary to increase the cathode current density in order to make the chromium layer deposition.

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